I. Identification

Last name: BOICHOT   First name: Raphaël

Assistant Professor at Grenoble-INP Phelma (France)

 

II. Activities between 2007 et 2017

1.     Publications :

 

●  Chromium carbide growth at low temperature by a highly efficient DLIMOCVD process in effluent recycling mode. A. Michau, F. Maury, F. Schuster, R. Boichot, M. Pons, E. Monsifrot. Surface & Coatings Technology 322 (2017) 96–104.

●  Epitaxial Growth of AlN on (0001) Sapphire: Assessment of HVPE Process by a Design of Experiments Approach. R Boichot, D Chen*, F Mercier, F Baillet, G Giusti, T Coughlan, M Chubarov, M. Pons. Coatings 7 (9), 136, 2017.

●  HVPE of aluminum nitride, film evaluation and multiscale modeling of the growth process. M Pons, J Su, M Chubarov, R Boichot, F Mercier, E Blanquet, G Giusti, D Pique. Journal of Crystal Growth 468, 235-240, 2017.

●  Evidence for a Cr metastable phase as a tracer in DLI-MOCVD chromium hard coatings usable in high temperature environment. A Michau, F Maury, F Schuster, R Boichot, M Pons. Applied Surface Science Volume 422, 15 November 2017, Pages 198-206.

●  Evaluation of Alternative Atomistic Models for the Incipient Growth of ZnO by Atomic Layer Deposition. MH Chu, L Tian, A Chaker, E Skopin, V Cantelli, T Ouled, R Boichot, A. Crisci, S. Lay, M.-I. Richard, O. Thomas, J.-L. Deschanvres, H. Renevier, D. Fong, G. Ciatto. Journal of Electronic Materials 46 (6), 3512-3517, 2017.

●  Growth of aluminum nitride on flat and patterned Si (111) by high temperature halide CVD. M Chubarov*, F Mercier, S Lay, F Charlot, A Crisci, S Coindeau, T Encinas, G Ferro, R Reboud, R Boichot. Thin Solid Films 623, 65-71, 2017.

●  An atomistic view of the incipient growth of zinc oxide nanolayers. MH Chu, L Tian, A Chaker, V Cantelli, T Ouled, R Boichot, A Crisci, S Lay, M.-I. Richard, O Thomas, JL Deschanvres, H Renevier, D Fong, G Ciatto. Crystal Growth & Design 16 (9), 5339-5348.

●  A genetic algorithm for topology optimization of area-to-point heat conduction problem. Boichot, R.; Fan, Y. International Journal of Thermal Sciences. Volume 108, October 2016, Pages 209–217.

●  Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition. Boichot, R.; Tian, L*.; Richard M.-I.; Crisci, A.; Chaker, A.; Cantelli, V.;  Coindeau, S.; Lay S.; Ouled, T.; Guichet, C.; Chu, M. H.; Aubert, N.; Ciatto, G.;  Blanquet, E.; Thomas, o.; Deschanvres, J.-L.; Fong, D. D.; Renevier, H., Chem. Mater., 2016, 28 (2), pp 592–600.

●  Growth of boron nitride films on w-AlN (0001), 4° off-cut 4H-SiC (0001), W (110) and Cr (110) substrates by Chemical Vapor Deposition. Coudurier, N; Chubarov, M.; Boichot, R.; Mercier, F.; Blanquet, E.; Reboud, R.; Lay, S.; Crisci, A.; Coindeau, S.; Encinas, T.; Pons, M., Cryst. Res. Technol., 1–8 (2016) / DOI 10.1002/crat.201500284.

●  Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid-pulsed CVD, Boichot, R.; Krumdieck, S., Chem. Vap. Deposition 2015, 21, 375–384.

●  Undoped TiO2 and nitrogen-doped TiO2 thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications. Tian, L.; Soum-Glaude, A.; Volpi, F.; Salvo, L.; Berthome, G.; Coindeau, S.; Mantoux, A.; Boichot, R.; Lay, S.; Brize, V.; Blanquet, E.; Giusti, G.; Bellet, D., Journal of Vacuum Science & Technology A 2015, 33 (1).

●  Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy. Claudel, A.; Fellmann, V.; Gelard, I.; Coudurier, N.; Sauvage, D.; Balaji, M.; Blanquet, E.; Boichot, R.; Beutier, G.; Coindeau, S.; Pierret, A.; Attal-Tretout, B.; Luca, S.; Crisci, A.; Baskar, K.; Pons, M., Thin Solid Films 2014, 573, 140-147.

●  Niobium nitride thin films deposited by high temperature chemical vapor deposition. Mercier, F.; Coindeau, S.; Lay, S.; Crisci, A.; Benz, M.; Encinas, T.; Boichot, R.; Mantoux, A.; Jimenez, C.; Weiss, F.; Blanquet, E., Surface & Coatings Technology 2014, 260, 126-132.

●  Photoelectrochemistry of Oxidation Layers: A Novel Approach to Analyze Photocurrent Energy Spectra. Petit, J. P.; Boichot, R.; Loucif, A.; Srisrual, A.; Wouters, Y., Oxidation of Metals 2013, 79 (3-4), 349-359.

●  High temperature chemical vapor deposition of aluminum nitride, growth and evaluation. Pons, M.; Boichot, R.; Coudurier, N.; Claudel, A.; Blanquet, E.; Lay, S.; Mercier, F.; Pique, D., Surface & Coatings Technology 2013, 230, 111-118.

●  M., Effects of the V/III ratio on the quality of aluminum nitride grown on (0001) sapphire by high temperature hydride vapor phase epitaxy. Coudurier, N.; Boichot, R.; Fellmann, V.; Claudel, A.; Blanquet, E.; Crisci, A.; Coindeau, S.; Pique, D.; Pons, In Physica Status Solidi C: Current Topics in Solid State Physics, Vol 10, No 3, Toropov, A.; Ivanov, S., Eds. 2013; Vol. 10, pp 362-365.

●  Epitaxial growth of AlN on c-plane sapphire by High Temperature Hydride Vapor Phase Epitaxy: Influence of the gas phase N/Al ratio and low temperature protective layer. Boichot, R.; Coudurier, N.; Mercier, F.; Lay, S.; Crisci, A.; Coindeau, S.; Claudel, A.; Blanquet, E.; Pons, M., Surface & Coatings Technology 2013, 237, 118-125.

●  CFD modeling of the high-temperature HVPE growth of aluminum nitride layers on c-plane sapphire: from theoretical chemistry to process evaluation. Boichot, R.; Coudurier, N.; Mercier, F.; Claudel, A.; Baccar, N.; Milet, A.; Blanquet, E.; Pons, M., Theoretical Chemistry Accounts 2013, 133 (1).

●  Experimental kinetic study of oxidation of uranium monocarbide powders under controlled oxygen partial pressures below 230 degrees. C. Berthinier, C.; Rado, C.; Dugne, O.; Cabie, M.; Chatillon, C.; Boichot, R.; Blanquet, E., Journal of Nuclear Materials 2013, 432 (1-3), 505-519.

●  Effects of AlN nucleation layers on the growth of AlN films using high temperature hydride vapor phase epitaxy. Balaji, M.; Claudel, A.; Fellmann, V.; Gelard, I.; Blanquet, E.; Boichot, R.; Pierret, A.; Attal-Tretout, B.; Crisci, A.; Coindeau, S.; Roussel, H.; Pique, D.; Baskar, K.; Pons, M., Journal of Alloys and Compounds 2012, 526, 103-109.

●  Significance of initial stages on the epitaxial growth of AlN using high temperature halide chemical vapor deposition. Balaji, M.; Claudel, A.; Fellmann, V.; Gelard, I.; Blanquet, E.; Boichot, R.; Coindeau, S.; Roussel, H.; Pique, D.; Baskar, K.; Pons, M., In Physica Status Solidi C: Current Topics in Solid State Physics, Vol 9, No 3-4, Parbrook, P. J.; Martin, R. W.; Halsall, M. P., Eds. 2012; Vol. 9, pp 511-514.

●  Conformal Atomic Layer Deposition of TA-Based Diffusion Barrier Film Using a Novel Mono-Guanidinate Precursor. Prieur, T.; Brize, V.; Cornier, T.; Doisneau, B.; Farcy, A.; Boichot, R.; Mantoux, A.; Daniele, S.; Blanquet, E., Journal of Nanoscience and Nanotechnology 2011, 11 (9), 8383-8386.

●  Aluminum nitride homoepitaxial growth on polar and non-polar AlN PVT substrates by high temperature CVD (HTCVD). Claudel, A.; Chowanek, Y.; Blanquet, E.; Chaussende, D.; Boichot, R.; Crisci, A.; Berthome, G.; Mank, H.; Luca, S.; Pique, D.; Pons, M., In Physica Status Solidi C: Current Topics in Solid State Physics, Vol 8, No 7-8, 2011; Vol. 8.

●  Growth and Characterization of Thick Polycrystalline AlN Layers by HTCVD. Claudel, A.; Blanquet, E.; Chaussende, D.; Boichot, R.; Martin, R.; Mank, H.; Crisci, A.; Doisneau, B.; Chaudouet, P.; Coindeau, S.; Pique, D.; Pons, M., Journal of the Electrochemical Society 2011, 158 (3), H328-H332.

●  Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process. Claudel, A.; Blanquet, E.; Chaussende, D.; Boichot, R.; Doisneau, B.; Berthome, G.; Crisci, A.; Mank, H.; Moisson, C.; Pique, D.; Pons, M., Journal of Crystal Growth 2011, 335 (1), 17-24.

●  Developments of TaN ALD Process for 3D Conformal Coatings. Brize, V.; Prieur, T.; Violet, P.; Artaud, L.; Berthome, G.; Blanquet, E.; Boichot, R.; Coindeau, S.; Doisneau, B.; Farcy, A.; Mantoux, A.; Nuta, I.; Pons, M.; Volpi, F., Chemical Vapor Deposition 2011, 17 (10-12), 284-295.

●  Experimental study of uranium carbide pyrophoricity. Berthinier, C.; Coullomb, S.; Rado, C.; Blanquet, E.; Boichot, R.; Chatillon, C., Powder Technology 2011, 208 (2), 312-317.

●  Flow Distribution and Mass Transfer in a Parallel Microchannel Contactor Integrated with Constructal Distributors. Yue, J.; Boichot, R.; Luo, L. G.; Gonthier, Y.; Chen, G. W.; Yuan, Q., Aiche Journal 2010, 56 (2), 298-317.

●  Night cooling with a Ventilated Internal Double Wall. Fraisse, G.; Boichot, R.; Kouyoumji, J. L.; Souyri, B., Energy and Buildings 2010, 42 (3), 393-400.

●  ALD TaN from PDMAT in TSV architectures. Brize, V.; Artaud, L.; Berthome, G.; Boichot, R.; Daniele, S.; Nuta, I.; Mantoux, A.; Blanquet, E., In Atomic Layer Deposition Applications 6, Elam, J. W.; DeGendt, S.; VanDerStraten, O.; Delabie, A.; Londergan, A.; Bent, S. F.; Roozeboom, F., Eds. 2010; Vol. 33, pp 183-193.

●  Epitaxial and polycrystalline growth of AlN by high temperature CVD: Experimental results and simulation. Boichot, R.; Claudel, A.; Baccar, N.; Milet, A.; Blanquet, E.; Pons, M., Surface & Coatings Technology 2010, 205 (5), 1294-1301.

●  A simple Cellular Automaton algorithm to optimise heat transfer in complex configurations. Boichot, R.; Luo, L. G., International Journal of Exergy 2010, 7 (1), 51-64.

●  High temperature chemical vapor deposition of AlN/W1-xRex coatings on bulk SiC. Roki, F. Z.; Pons, M.; Mercier, F.; Boichot, R.; Bernard, C.; Blanquet, E.; Morais, M.; Huot, G.; Claudel, A.; Pique, D.; Berne, P.; Poissonnet, S.; Chaffron, L., Surface & Coatings Technology 2010, 205 (5), 1302-1306.

●  Developments of ALD Processes: Experiments and Thermodynamic Evaluations. Blanquet, E.; Nuta, I.; Brize, V.; Boichot, R.; Mantoux, A.; Violet, P.; Daniele, S., In Atomic Layer Deposition Applications 6, Elam, J. W.; DeGendt, S.; VanDerStraten, O.; Delabie, A.; Londergan, A.; Bent, S. F.; Roozeboom, F., Eds. 2010; Vol. 33, pp 321-332.

●  Tree-network structure generation for heat conduction by cellular automaton. Boichot, R.; Luo, L. G.; Fan, Y. L., Energy Conversion and Management 2009, 50 (2), 376-386.

●  Treatment of submicron particles using an electrostatic agglomerator in DC-negative voltage: Re-entrainment experimental study and modeling. Boichot, R.; Charvet, A.; Goldin, T.; Bernis, A., Journal of Electrostatics 2009, 67 (4), 574-582.

●  Flow Distribution Property of the Constructal Distributor and Heat Transfer Intensification in a Mini Heat Exchanger. Fan, Y. L.; Boichot, R.; Goldin, T.; Luo, L. G., Aiche Journal 2008, 54 (11), 2796-2808.

●  Agglomeration of diesel particles by an electrostatic agglomerator under positive DC voltage: Experimental study. Boichot, R.; Bernis, A.; Gonze, E., Journal of Electrostatics 2008, 66 (5-6), 235-245.

●  Treatment of diesel particles using an electrostatic agglomerator under negative DC corona: A modeling and experimental study. Boichot, R.; Bernis, A.; Gonze, E., Ieee Transactions on Plasma Science 2007, 35 (3), 675-692.

 

2.     Supervision of doctoral works:

● 2007-2010 : Clément Berthinier. « Etude thermodynamique et cinétique de la pyrophoricité du carbure d’uranium ». 1 october 2010. CEA granting.

● 2010-2013 : Nicolas Coudurier. « Contribution à l’épitaxie de nitrures d’aluminium et de bore par dépôt chimique en phase vapeur à haute température » 16 january 2014. CIFRE granting (ACERDE).

● 2010-2014 : Adrien Le Gentil. « De l'influence des phénomènes de surface sur l'amortissement mécanique d'un résonateur en silice : application au Gyroscope Résonant Hémisphérique »  3 july 2014. CIFRE granting (SAGEM).

● 2013-2016 : Alexandre Michau. « Croissance de chrome par CVD pour revêtement interne de tubes zirconium à haut facteur de forme » In progress. CEA granting.

 

III. Diplomas and employers

●  1998: Technician Degree in Biological Engineering (Université de Toulon et du Var, France).

● 2001: Engineer Degree in Process Engineering (Polytech’Savoie, France). Final internship at Ahlstrom Company. Topic: glass fiber filters for diesel particles.

●  2001: Master Degree in Chemical Engineering (Polytech’Savoie, France). Internship at Renault SA Company. Topic: diesel particle electrostatic precipitator.

●  2005: PhD in Process Engineering (Polytech’Savoie, France). CIFRE granting. Employer Renault SA. Research topic: diesel particle electrostatic precipitator.

●  2005-2006: Research Engineer for Renault SA.

● 2006-2007: Post-doctoral period at Université de Savoie (France). Research topic: numerical optimization of heat transfer.

● 2007-2014: Assistant Professor at Genoble-INP, Phelma. Research topics: thermodynamic and process optimization.

● 2017: habilitation in Material Science/Chemical Engineering.